Company: imec
LinkedIn Post Text: Press Release – imec demonstrates readiness of the High-NA EUV patterning ecosystem.Steven Scheer: “It has been imec’s role, in tight collaboration with ASML and our extended supplier network, to ensure timely availability of advanced resist materials, photomasks, metrology techniques, (anamorphic) imaging strategies, and patterning techniques.”Read the full press release: https://lnkd.in/emr3BFUyReadiness of these processes for High-NA enablement is shown in more than 25 papers presented at the 2024 SPIE Advanced Lithography & Patterning Conference, more info: https://lnkd.in/e5hauwV6 ASML
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Media Link: https://www.imec-int.com/en/press/imec-demonstrates-readiness-high-na-euv-patterning-ecosystem?utm_campaign=imec%20Press%20release%2026-02-2024&utm_medium=email&utm_source=eloqua
Media Link Content: Imec demonstrates readiness of the High-NA EUV ecosystem | imec
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